Description

Titanium polishing is a process to polish titanium and titanium alloys to a high degree of surface smoothness, typically of a nanometer level. The polishing method is based on an electrolytic process in which material is removed from the surface by a chemical reaction powered by applying a low voltage.
Technology used at CERN to polish the cavities of the accelerators to obtain an ultra smooth surface and to avoid sparks.

Area of expertise

Materials Science

Applications

• Vacuum technology
• Medical industry: implants, tools
• Jewelleries, spectacles frames, watches
• Aerospace: turbine blades
• Electronics, storage discs

Innovative features

• The chemical composition of the bath
• The polishing method

Specifications

• Temperature of bath: 10 – 30 degrees C
• Achievable roughness: Ra of around 0.05 to 0.10 µm
• Voltage: approximately 10 V
• Polishing speed: 1 – 2,5 µm/minute. Applied current: 5 – 14 A/dm2

Advantages

• The metal can be polished down to the nanometer level
• Enables efficient detection of flaws in the surface
• The process can be run with low power consumption
• Creates a shining, mirror like appearance
• Provides easy maintenance of hygienically clean surfaces due to reduced particle adhesion
• There is practically no size limitation on the item to be polished
• Provides metallic purity and chemical passivity

Intellectual Property status

Available for licensing and partnerships. Patent granted in Europe, France, Russia and USA. PCT. WO0100906.